Optical and chemical characterization of expanding thermal plasma-deposited carbon-containing silicon dioxide-like films-Reference-Cited by-同舟云学术

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Optical and chemical characterization of expanding thermal plasma-deposited carbon-containing silicon dioxide-like films

Published:2008-10 Issue:23 Volume:516 Page:8547-8553
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Creatore M.,Rieter S.M.,Barrell Y.,van de Sanden M.C.M.,Vernhes R.,Martinu L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference45 articles.

1. Low Dielectric Constant Materials,1997

2. Challenges for structural stability of ultra-low-k-based interconnects

3. Plasma deposition of optical films and coatings: A review

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