Modifications of reactively sputtered titanium nitride films by argon and vanadium ion implantation: Microstructural and opto-electric properties-Reference-Cited by-同舟云学术

Modifications of reactively sputtered titanium nitride films by argon and vanadium ion implantation: Microstructural and opto-electric properties

Published:2013-03 Issue: Volume:531 Page:189-196
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Popović M.,Novaković M.,Traverse A.,Zhang K.,Bibić N.,Hofsäss H.,Lieb K.P.

Funder

Ministry of Sciences and Environmental Protection of the Republic of Serbia

Deutsche Forschungsgemeinschaft

French-Serbian CNRS-MSTD

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference53 articles.

1. Handbook of Tribology;Bushan,1991

2. Handbook of Refractory Carbides and Nitrides — Properties, Characteristics, Processing and Applications;Pierson,1996

3. Handbook of Hard Coatings: Deposition Technologies, Properties and Applications;Bunshah,2001

4. Articles on Nitrides, Including: Boron Nitride, Beta Carbon Nitride, Gallium Nitride, Borazon, Aluminium Nitride, Nitride, Strontium Nitride, Titanium Nitride, Indium Nitride, Calcium Nitride, Lithium Nitride, Zirconium Nitride, Hephaestus Books,2011

5. Wachstum und Eigenschaften von ionenstrahlunterstützt aufgedampften TiN-Schichten;Wolff,2000

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