Growth of ultrathin barrier InAlGaN/GaN heterostructures with superior properties using sputtered AlN/sapphire templates and optimized group-III injection rate by metalorganic chemical vapor phase deposition

Author:

Zheng Xia-Xi,Wang Chun,Huang Jian-Hao,Huang Jen-Yao,Ueda Daisuke,Pande Krishna,Dee Chang Fu,Lee Ching Ting,Chang Edward-Yi

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference44 articles.

1. GaN HEMT and MMIC development at Fraunhofer IAF–Performance and reliability;Wu;IEEE Trans. Electron Devices,2001

2. GaN HEMT and MMIC development at Fraunhofer IAF–Performance and reliability;Waltereit;Phys. Status Solidi (A),2009

3. Short-channel effect limitations on high-frequency operation of AlGaN/GaN HEMTs for T-Gate devices;Jessen;IEEE Trans. Electron Devices,2007

4. Short-channel effects in AlGAN/GaN HEMTs;Breitschädel;Mater. Sci. Eng.,2001

5. InAlN/GaN HEMTs with AlGaN back barriers;Lee;IEEE Electron Device Lett.,2011

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