Conversion of the conduction type of a catalytic-chemical-vapor-deposited p-type a-Si by PH3 plasma ion implantation-Reference-Cited by-同舟云学术

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Conversion of the conduction type of a catalytic-chemical-vapor-deposited p-type a-Si by PH3 plasma ion implantation

Published:2019-08 Issue: Volume:683 Page:150-155
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Tu Huynh-Thi-Cam,Koyama Koichi,Yamaguchi Noboru,Suzuki Hideo,Ohdaira Keisuke,Matsumura Hideki

Funder

New Energy and Industrial Technology Development Organization

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Silicon heterojunction solar cell with interdigitated back contacts for a photoconversion efficiency over 26%;Yoshikawa;Nat. Energy,2017

2. Exceeding conversion efficiency of 26% by heterojunction interdigitated back contact solar cell with thin film Si technology;Yoshikawa;Sol. Energy Mater. Sol. Cells,2017

3. Development of heterojunction back contact Si solar cells;Nakamura;IEEE J. Photovoltaics,2014

4. Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon;Matsumura;J. Appl. Phys.,1989

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