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Design and characterization of a two-axis, flexure-based nanopositioning stage with 50 mm travel and reduced higher order modes

  • Published:2018-07 Issue: Volume:53 Page:236-247
  • ISSN:0141-6359
  • Container-title:Precision Engineering
  • language:en
  • Short-container-title:Precision Engineering

Author:

Roy Nilabh K.ORCID,Cullinan Michael A.ORCID

Funder

NXP Semiconductors

Publisher

Elsevier BV

Subject

General Engineering

Reference32 articles.

1. EUV lithography: lithography gets extreme;Wagner;Nat Photonics,2010

2. Passive compliant wafer stage for single-step nano-imprint lithography;Choi;Rev Sci Instrum,2005

3. Application of a positioning and measuring machine for metrological long-range scanning force microscopy;Hausotte;Opt Photonics,2005

4. Atomic force microscope with improved scan accuracy, scan speed, and optical vision;Kwon;Rev Sci Instrum,2003

5. Long-range motion with nanometer precision;O’Brien;Photonics Spectra,2005

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