Ion Beam Lithography-Reference-Cited by-同舟云学术

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Ion Beam Lithography

Published:2001 Issue: Volume: Page:4274-4280
ISSN:
Container-title:Encyclopedia of Materials: Science and Technology
language:
Short-container-title:

Author:

Melngailis J.

Publisher

Elsevier

Reference9 articles.

1. The characterization and optimization of masked ion beam lithography with 〈100〉 silicon channeling masks;Atkinson;J. Vac. Sci. Technol,1987

2. Damage characterization of ion beam exposed metal-oxide-semiconductor varactor cells by charge to breakdown measurements;Brünger;J. Vac. Sci. Technol,1995

3. Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices;Brünger;J. Vac. Sci. Technol,1999

4. Ion projection lithography: international development program;Kaesmair;J. Vac. Sci. Technol,1999

5. Focused ion beam lithography;Melngailis;Nucl. Instrum. Methods Phys. Res,1993

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