Benzene and toluene gas-phase photocatalytic degradation over H2O and HCL pretreated TiO2: by-products and mechanisms
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy,General Chemical Engineering,General Chemistry
Reference36 articles.
1. Trichloroethylene-Promoted Photocatalytic Oxidation of Air Contaminants
2. O. d'Hennezel, Ph.D. thesis, North Carolina State University/Ecole Centrale de Lyon, 1998
3. Heterogeneous Photocatalytic Oxidation of Trichloroethylene and Toluene Mixtures in Air: Kinetic Promotion and Inhibition, Time-Dependent Catalyst Activity
4. Heterogenous photocatalytic oxidation of dilute toluene-chlorocarbon mixtures in air
5. Toluene oxidation on u.v.-irradiated titanium dioxide with and without O2, NO2 OR H2O at ambient temperature
Cited by 299 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Photocatalytic removal of VOCs on TiO2 nanotube layers. Effect of layer thickness and humidity;Journal of Photochemistry and Photobiology A: Chemistry;2024-09
2. Simultaneous effect of oxygen impurity and flow rate of purge gas on adsorption capacity of and heel buildup on activated carbon during cyclic adsorption-desorption of VOC;Journal of Hazardous Materials;2024-09
3. A new attempt to remove toluene using nickel–iron bimetallic particle electrode reactor;Scientific Reports;2024-05-02
4. Photocatalytic Reduction of VOCs with Ag/Ni-Doped Photocatalyst in Different Temperature and Humidity Environments;Atmosphere;2024-01-06
5. The effects of water, substrate, and intermediate adsorption on the photocatalytic decomposition of air pollutants over nano-TiO2 photocatalysts;Physical Chemistry Chemical Physics;2024
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3