Mechanism of CVD of boron by hydrogen reduction of BCl3 in a dual impinging-jet reactor-Reference-Cited by-同舟云学术

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Mechanism of CVD of boron by hydrogen reduction of BCl3 in a dual impinging-jet reactor

Published:1999-07 Issue:15-16 Volume:54 Page:3297-3304
ISSN:0009-2509
Container-title:Chemical Engineering Science
language:en
Short-container-title:Chemical Engineering Science

Author:

Asli Sezgi N.,Dogu Timur,Onder Ozbelge H.

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Computational investigation on adsorption characteristics of aromatic amine for SiHCl ₃ -BCl ₃ system;Molecular Physics;2024-04-27

2. A density functional theory study on adsorption of SiHCl3-BCl3 by model molecules of g-C3N4;Materials Today Communications;2024-03

3. Boron Impurity Deposition on a Si(100) Surface in a SiHCl3-BCl3-H2 System for Electronic-Grade Polysilicon Production;Minerals;2022-05-21

4. Gas‐phase kinetic of boron carbide chemical vapor deposition using BCl ₃ +CH ₄ +H ₂ mixture;Journal of the American Ceramic Society;2022-02-18

5. Equilibrium Chemistry in $${\text {BCl}}_3$$ BCl 3 – $${\text {H}}_2$$ H 2 –Ar Plasma;Plasma Chemistry and Plasma Processing;2019-04-10

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