Author:
Lallart Adeline,Garnier Philippe,Lorenceau Elise,Cartellier Alain,Charlaix Elisabeth
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. Understanding of wet and alternative particle removal processes in microelectronics: theoretical capabilities and limitations;Tardif;J. Telecommun. Inf. Technol.,2005
2. Mechanism of particle removal by megasonic waves;Kim;Appl. Phys. Lett.,2009
3. J. T. Snow, K. Miya, M. Sato, M. Kato, and T. Tanaka, “Advances in Particle Removal without Damage,” 2015.
4. Evaluation of Particle Removal Efficiency in Wafer cleaning Processes;Narayanswami;Semicond. Int. Mag.,2000
5. Mold cleaning with polydimethylsiloxane ( PDMS ) for nanoimprint lithography;Lin;Nanotechnology,2013
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