1. Chemical-sensitive field-effect transistor;Sibbald;IEE Proc.,1983
2. Basic properties of MIS structures containing borazone and diamond layers produced by the reactive pulse plasma method;Szmidt;Thin Solid Films,1983
3. M. Duszak and A. Jakubowski, Conduction in AlCSiOxSi structures, Thin Solid Films, to be published.
4. M. Duszak, A. Jakubowski and J. Szmidt, Conduction current in MIS structures with thin carbon layers formed by the RPP method, Proc. 13th Yugoslav Conf. on Micro-electronic, MIEL-85, 599 - 606.
5. Conduction in thin dielectric films;Simmons;J. Phys. D: Appl. Phys.,1971