Thermodynamic study on the chemical vapor deposition of silicon nitride from the SiCl4–NH3–H2 system-Reference-Cited by-同舟云学术

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Thermodynamic study on the chemical vapor deposition of silicon nitride from the SiCl4–NH3–H2 system

Published:2015-01 Issue: Volume:1051 Page:93-103
ISSN:2210-271X
Container-title:Computational and Theoretical Chemistry
language:en
Short-container-title:Computational and Theoretical Chemistry

Author:

Ren Haitao,Zhang Litong,Su Kehe,Zeng Qingfeng,Cheng Laifei

Funder

National Natural Science Foundation of China

NPU Foundation for Fundamental Research

National Basic Research Program of China (973 Program)

Basic Research Foundation of NWPU

Foreign Talents Introduction and Academic Exchange Program

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Condensed Matter Physics,Biochemistry

Reference34 articles.

1. Prediction of new low compressibility solids;Liu;Science,1989

2. Experimental and theoretical equations of state of cubic boron nitride;Knittle;Nature,1989

3. Structure investigation of photo-CVD silicon nitride films by IR and ESR spectroscopy;Nikolic;Vacuum,1990

4. Solid-state chemistry with nonmetal nitrides;Schnick;Angew. Chem. Int. Ed. Engl.,1993

5. A combined experimental and theoretical study of the neutral, cationic and anionic Si3N cluster molecule;Goldberg;J. Chem. Phys.,1994

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1. Preparation of high‐purity α‐Si₃N₄ powder via multifunctional synergistic catalysis and pretreatment method;International Journal of Applied Ceramic Technology;2024-04-19

2. Study on thermodynamics and kinetics of chemical vapor deposition of silicon nitride;Materials Research Express;2020-10-01

3. Efficient Preparation of Si3N4 by Microwave Treatment of Solar-Grade Waste Silicon Powder;ACS Omega;2020-03-04

4. Influence of Deposition Temperature and Heat Treatment on Silicon Nitride Coat ing Deposited by LPCVD;Journal of Inorganic Materials;2019

5. Thermodynamic study of the chemical vapor deposition in the SiCl3CH3–NH3–H2 system;Chemical Physics Letters;2015-03

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