Effects of bottom electrodes on dielectric properties of ECR-PECVD Ta2O5 thin film
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science
Reference6 articles.
1. Oxidized Ta/sub 2/O/sub 5//Si/sub 3/N/sub 4/ dielectric films on poly-crystalline Si for dRAMs
2. Photoluminescence Study of GaAs Grown on (001) Si
3. Influence of SiO2at the Ta2O5/Si interface on dielectric characteristics of Ta2O5capacitors
4. Interfacial Oxidation of Silicon Substrates Through Ta2 O 5 Films
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1. Hollow waveguides with low intrinsic photoluminescence fabricated with Ta2O5 and SiO2 films;Applied Physics Letters;2011-02-28
2. Valve Metal, Si and Ceramic Oxides as Dielectric Films for Passive and Active Electronic Devices;Advances in Electrochemical Sciences and Engineering;2008-08-20
3. Electrical characteristics of Ti–O/Ta2O5 thin film sputtered on Ta/Ti/Al2O3 substrate;Thin Solid Films;2004-01
4. Enhanced chemical vapor deposition of tantalum oxide thin films fromin-situreduction of PtOx electrode;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2003-03
5. The electrical properties of high-dielectric-constant and ferroelectric thin films for very large scale integration circuits;Handbook of Thin Films;2002
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