Modeling and temperature control of rapid thermal processing-Reference-Cited by-同舟云学术

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Modeling and temperature control of rapid thermal processing

Published:2006-02 Issue:4 Volume:30 Page:686-697
ISSN:0098-1354
Container-title:Computers & Chemical Engineering
language:en
Short-container-title:Computers & Chemical Engineering

Author:

Dassau Eyal,Grosman Benyamin,Lewin Daniel R.

Publisher

Elsevier BV

Subject

Computer Science Applications,General Chemical Engineering

Reference22 articles.

1. Dynamic uniformity control in a rapid thermal processing system;Balakrishnan,1999

2. Rapid thermal processing of semiconductors;Borisenko,1997

3. A model predictive controller for multivariable temperature control in rapid thermal processing;Breedijk,1993

4. Model-based control of rapid thermal processes;Breedijk,1994

5. A high-order terminal iterative learning control scheme RTP-CVD application;Chen,1997

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1. Measurement of spectral transmissivity of quartz plates used in rapid thermal processing;Optical Materials;2024-03

2. Sparse identification modeling and predictive control of wafer temperature in an atomic layer etching reactor;Chemical Engineering Research and Design;2024-02

3. Data-Driven Modelling and Robust Control of a Semiconductor Manufacturing Process;IFAC-PapersOnLine;2023

4. Observer design for a nonlinear heat equation: Application to semiconductor wafer processing;Journal of Process Control;2022-11

5. Low-Dimensional Non-Linear Luenberger Observer for Thermal Distribution of Wafer in Rapid Thermal Processing Process;2022 IEEE 11th Data Driven Control and Learning Systems Conference (DDCLS);2022-08-03

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