Insight on the oxidation resistance of UO N layers: A density functional study-Reference-Cited by-同舟云学术

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Insight on the oxidation resistance of UO N layers: A density functional study

Published:2016-10 Issue: Volume:123 Page:224-231
ISSN:0927-0256
Container-title:Computational Materials Science
language:en
Short-container-title:Computational Materials Science

Author:

Wang Xin,Long Zhong,Huang He,Bin Ren,Hu Yin,Luo Lizhu,Liu Ke-Zhao,Zhang Peng-Cheng

Funder

NSFC

Science and Technology on Surface Physics and Chemistry Laboratory

Publisher

Elsevier BV

Subject

Computational Mathematics,General Physics and Astronomy,Mechanics of Materials,General Materials Science,General Chemistry,General Computer Science

Reference53 articles.

1. DFT calculations of point defects on UN(001) surface

2. UN2−x layer formed on uranium metal by glow plasma nitriding

3. Study on the electronic structure of α-U2N3 by XPS and first principles

4. Photoemission study of UNxOy and UCxOy in thin films

5. The interaction of uranium metal with nitrogen oxides: The formation of an oxynitride surface layer

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Insight into the initial oxidation of UN1.85 thin films;Applied Surface Science;2020-09

2. Studies on the oxidation of UN0.1 films;Journal of Electron Spectroscopy and Related Phenomena;2020-07

3. Molecular reactions and oxidation corrosion on UN (001) surface under exposure to environment gases: A DFT study;Journal of Nuclear Materials;2020-05

4. Chemical State of U in U–N–O Ternary System from First-Principles Calculations;The Journal of Physical Chemistry C;2019-06-27

5. Microstructural degradation of UN and UN-UO2 composites in hydrothermal oxidation conditions;Journal of Nuclear Materials;2019-05

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