Mechanisms of lamellar structure formation and Cr interfacial segregation in C11b-MoSi2/C40-NbSi2 dual phase silicide verified by a phase-field simulation incorporating elastic inhomogeneity-Reference-Cited by-同舟云学术

Mechanisms of lamellar structure formation and Cr interfacial segregation in C11b-MoSi2/C40-NbSi2 dual phase silicide verified by a phase-field simulation incorporating elastic inhomogeneity

Published:2015-10 Issue: Volume:108 Page:358-366
ISSN:0927-0256
Container-title:Computational Materials Science
language:en
Short-container-title:Computational Materials Science

Author:

Yamazaki Toshihiro,Koizumi Yuichiro,Yuge Koretaka,Chiba Akihiko,Hagihara Koji,Nakano Takayoshi,Kishida Kyosuke,Inui Haruyuki

Funder

Japan Science and Technology Agency

Center for Computational Materials Science

Institute for Materials Research, Tohoku University

Cyber Science Center, Tohoku University

Publisher

Elsevier BV

Subject

Computational Mathematics,General Physics and Astronomy,Mechanics of Materials,General Materials Science,General Chemistry,General Computer Science

Reference37 articles.

1. High-temperature structural intermetallics

2. Plastic deformation of MoSi2 single crystals

3. High temperature plastic anisotropy in MoSi2 single crystals

4. High temperature deformation of MoSi2 single crystals with the C11b structure

5. Tensile deformation and fracture behaviour in NbSi2 and MoSi2 single crystals

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