Evaluation of Spectral Profiles of KrF Excimer Lasers for Microlithography
Author:
Affiliation:
1. Innovation Center 2, Research Division, Komatsu Ltd.
2. Manufacturing Division Gigaphoton Inc.
3. Component Development Division Gigaphoton Inc.
4. Graduate School of Engineering Sciences, Kyushu University
Publisher
Laser Society of Japan
Link
http://www.jstage.jst.go.jp/article/lsj/31/7/31_7_482/_pdf
Reference13 articles.
1. 1) P. Yan, O. Qian, J. Langston, and P. Leon: Proc. Optical Microlithography V SPIE 1674, 1992 (SPIE, San Jose USA 1992) p.316.
2. 2) A. Kroyan, J. Bendik, O. Semprez, N. Farrar, and C. Rowan: Proc. Optical Microlithography XIII SPIE 4000, 2000 (SPIE, Santa Clara USA 2000) p.658.
3. Optical properties of a 5 m echelle vacuum spectrometer with an approximately diffraction-limited resolving power in the order of 106
4. Tests performed with the improved MEGA spectrometer
5. A new class of multiple dispersion grating spectrometers
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