1. 2) K. Nishihara, A. Sasaki, A. Sunahara, and T. Nishikawa: to be published in SOIE (2005).
2. 4) H. Mizoguchi, K. Murakami, S. Okazaki, H. Yoneda, T. Tomie, A. Endo, E. Hotta, H. Sato, and K. Toyoda: J. Plasma Fusion Res. 79 No.3 (2003).
3. 5) V. Banine: “Requirements for the Next Generation Lithography EUV Sources,” 1st International EUVL Symposium, Oct. 14-17, 2002, Dallas, USA.
4. 6) E. Turcu, et al.: “JMAR Laser-Plasma Source for EUV Lithography,” EUVL Source Workshop, Oct. 29, 2001, Matzue, Japan.
5. 7) D. Mover, et al.: “Progress and Current Performance for Laser-Produced Plasma EUV Sources TRW/Cutting Edge Optronics,” 1st International Symposium on EUVL, Oct. 16, 2002, Dallas, USA.