Photo-etching of PMMA by Excimer Laser Irradiation-Reference-Cited by-同舟云学术

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Photo-etching of PMMA by Excimer Laser Irradiation

Published:1980 Issue:6 Volume:8 Page:941-943
ISSN:0387-0200
Container-title:The Review of Laser Engineering
language:en
Short-container-title:The Review of Laser Engineering

Author:

KAWAMURA Yoshiyuki¹,TOYODA Koichi¹,NAMBA Susumu¹

Affiliation:

1. The Institute of Physical and Chemical Research

Publisher

Laser Society of Japan

Link

http://www.jstage.jst.go.jp/article/lsj1973/8/6/8_6_941/_pdf

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dynamics of excited and ionic states of N,N,N′,N′-tetramethyl-p-phenylenediamine in poly(methyl methacrylate) under ablation condition;Research on Chemical Intermediates;1998-08

2. Switching from photochemical to photothermal mechanism in laser ablation of benzene solutions;Journal of Applied Physics;1997-12

3. Deep uv submicron lithography by using a pulsed high‐power excimer laser;Journal of Applied Physics;1982-09

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