High Entropy Thin Films by Magnetron Sputtering: Deposition, Properties and Applications

Abstract

Surface coating is of a great interest to increase the performances of the materials and extend its lifetime. High entropy films (HEFs) become the hot spot for developing surface engineering applications due to their good performances. They are reported to have superior properties such as good corrosion, wear resistance and excellent high temperature oxidation. Various deposition techniques have been exploited to fabricate HEFs such as laser cladding, spraying, sputter deposition and electrochemical deposition. These techniques are known to be an easy process to achieve a rapid quenching. Magnetron sputtering is seen as the most efficient methods to deposit the HEFs. Different gas can be used to prepare the ceramic materials. Besides, the deposition parameters reveal a strong influence on the physicochemical properties of HEFs. Working pressure, substrate temperature, bias voltage and gas mixture flow ratios have been reported to influence the morphology, microstructure, and functional properties of HEFs. The chapter overviews the development of the recent HEFs prepared by magnetron sputtering technique. First, it describes the principal of the technique. Then, it reports the classes of HEFs followed by the effect of the deposition parameters on their different properties. Applications have been developed using some HEFs for biomaterials and machining process.