Change of electrophysical properties of the Si(111) and Si(100) surface in the process of ion implantation and next annealing
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Published:2019-09-23
Issue:3
Volume:3
Page:
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ISSN:2522-9869
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Container-title:Eurasian Journal of Physics and Functional Materials
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language:
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Short-container-title:Eurasian j. phys. funct. mater.
Author:
Rysbaev A.S.,Bekpulatov I.R.,Igamov B.D.,Juraev Sh.X.
Publisher
L. N. Gumilyov Eurasian National University
Subject
Physics and Astronomy (miscellaneous),Condensed Matter Physics,Materials Science (miscellaneous),Nuclear and High Energy Physics,Radiation
Cited by
1 articles.
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