Preparing for 6G: Developing best practices and standards for industrial measurements of low-loss dielectrics

Author:

Enright Lucas1,Olszewska-Placha Marzena2,Hill Michael3,Phommakesone Say4,Kato Daisuke4,Hill Charles A.5,Kähäri Hanna6,Lee Chiawen7,Chen Chang-Sheng7,Orloff Nathan D.1,Celuch Malgorzata2,Ray Urmi8

Affiliation:

1. National Institute of Standards and Technology

2. QWED Sp. z o.o

3. Intel Corporation

4. Keysight Technologies

5. 3M Company

6. Nokia Corporation

7. Industrial Technology Research Institute

8. International Electronics Manufacturing Initiative

Publisher

IEEE

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. A Novel Q-Choked Resonator for Microwave Material Measurements Alleviating Sample Thickness Limitations of Existing Techniques;IEEE Microwave and Wireless Technology Letters;2024-06

2. High Frequency Assessment of Djordjevic-Sarkar Model for Low Loss Package Dielectrics;2024 IEEE 74th Electronic Components and Technology Conference (ECTC);2024-05-28

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