Author:
Yu Ziyang,Chen Guojin,Ma Yuzhe,Yu Bei
Cited by
18 articles.
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1. AdaOPC 2.0: Enhanced Adaptive Mask Optimization Framework for via Layers;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2024-09
2. Model-based OPC Extension in OpenILT;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10
3. Open-source differentiable lithography imaging framework;DTCO and Computational Patterning III;2024-04-10
4. FuILT: Full Chip ILT System With Boundary Healing;Proceedings of the 2024 International Symposium on Physical Design;2024-03-12
5. DevelSet: Deep Neural Level Set for Instant Mask Optimization;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-12