Novel Optimization Method using Machine-learning for Device and Process Competitiveness of BCD Process-Reference-Cited by-同舟云学术

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Novel Optimization Method using Machine-learning for Device and Process Competitiveness of BCD Process

Published:2020-09-23 Issue: Volume: Page:
ISSN:
Container-title:2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
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Author:

Kim Junhyeok,Yoo Jae-Hyun,Jung Jaehyun,Kim Kwangtea,Bae Jaehyun,Kim Yoon-suk,Kwon OhKyum,Kwon UiHui,Kim DaeSin

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9241573/9241588/09241590.pdf?arnumber=9241590

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Defect Passivation and Reliability Enhancement by Low-Temperature-High-Pressure Hydrogenation in LDMOS With 0.13-μm Bipolar-CMOS-DMOS Technology;IEEE Electron Device Letters;2023-05

2. Data-driven multi-objective optimization with neural network-based sensitivity analysis for semiconductor devices;Engineering Applications of Artificial Intelligence;2023-01

3. Applied Machine Learning for IIoT and Smart Production—Methods to Improve Production Quality, Safety and Sustainability;Sensors;2022-11-25

4. Analysis and Optimization of an Analog MOSFET with a Slit Well at Channel Center Towards Higher Output Resistance;ESSDERC 2022 - IEEE 52nd European Solid-State Device Research Conference (ESSDERC);2022-09-19

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