A Boltzmann Transport Equation Model for Substrate Damage During Focused Helium Ion Beam Fabrication of Nanostructures
Author:
Affiliation:
1. Southeast University,Dept. of Mechanical Engineering,Nanjing,China
Funder
National Natural Science Foundation of China
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10319472/10319477/10319509.pdf?arnumber=10319509
Reference20 articles.
1. Monte Carlo simulations of nanoscale focused neon ion beam sputtering
2. Monte Carlo simulations of nanoscale focused neon ion beam sputtering of copper: elucidating resolution limits and sub-surface damage
3. A review of recent advances in the spherical harmonics expansion method for semiconductor device simulation
4. A single nano-void precisely positioned in SiO2/Si substrate by focused helium ion beam technique
5. Visualizing with VTK: a tutorial
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