The Design and Some Emission Characteristics of an Economical dc Arc Plasmajet Excitation Source for Solution Analysis

Author:

Valente S. E.1,Schrenk W. G.1

Affiliation:

1. Kansas Agricultural Experiment Station, Department of Chemistry, Kansas State University, Manhattan, Kansas 66502

Abstract

The de-arc plasmajet has been applied to a large number of emission problems since its introduction in 1959 because it offers reduced matrix effects, stability, and moderate sensitivity. However, its use has been significantly limited due to operating costs associated with its high inert gas flow rates. A new excitation source, based on the principle of the plasma jet, has been developed that can operate at a much lower cost. The source operates from a conventional dc-arc power supply and uses commercially available electrodes. Total inert gas consumption is less than 2.5 liters/min. Stability of the source is better than 1% and reproducibility is approximately 4%. An excitation temperature of 5800 K was calculated from the relative intensities of several vanadium lines. The source can be operated continuously for several hours at a time. Design and some characteristics of the arc are presented. Detection limits are given for 12 elements. Six of the elements (Ca, Cr, Fe, Li, Ni, and Y) have detection limits below 10 ng/ml. Analytical response for the elements studied is linear over a wide concentration range. A calibration curve for Ca is presented which is linear over more than four orders of magnitude.

Publisher

SAGE Publications

Subject

Spectroscopy,Instrumentation

Cited by 62 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3