Coincidence Profiles for Sulfur Emission at 180.73 nm (Third Order) in ICP-AES

Author:

Attar K. M.1

Affiliation:

1. Central Analytical and Materials Characterization Laboratories, Research Institute, King Fahd University of Petroleum and Minerals, Dhahran 31261, Saudi Arabia

Abstract

Coincidence profiles of eleven prevalent concomitant elements, on the sulfur emission line at 180.73 nm in the third order, were procured by scanning the sulfur channel of a vacuum argon ICP-AES using the polychromator primary slit. VUV, as well as UV emission lines above 250 nm in the second order were observed, despite the fact that an interference filter with less than 2% transmission above 250 nm was located before the channel photomultiplier. Spectral interferences from Ca (1000 mg/L), Si (1000 mg/L), Cr (200 mg/L), and Ti (200 mg/L) were attributed to VUV emission lines; those from Mn (200 mg/L) to a UV line above 250 nm in the second order; and those from Fe (1000 mg/L) and V (200 mg/L) to VUV as well as UV lines. Background enhancement was exhibited by Al (1000 mg/L), Ni (200 mg/L), and Mg (1000 mg/L). Cu (200 mg/L) did not interfere. A simple procedure for distinguishing VUV from UV lines, by using the argon purge nozzle of the vacuum ICP-AES as an air optical filter, is demonstrated. The procedure is useful for facilities where a scanning monochromator is not available.

Publisher

SAGE Publications

Subject

Spectroscopy,Instrumentation

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3