Characterization of OH Radical 306.4 nm Emission in Argon and Helium Reduced-Pressure ICPs-Reference-Cited by-同舟云学术

Characterization of OH Radical 306.4 nm Emission in Argon and Helium Reduced-Pressure ICPs

Published:1987-05 Issue:4 Volume:41 Page:679-682
ISSN:0003-7028
Container-title:Applied Spectroscopy
language:en
Short-container-title:Appl Spectrosc

Author:

Fleitz P. A.¹,Seliskar C. J.¹

Affiliation:

1. Chemistry Department, University of Cincinnati, Cincinnati, Ohio 45221-0172

Abstract

The A → X emission of OH at 306.4 nm has been studied in reduced-pressure inductively coupled argon and helium plasmas. Under a variety of conditions of power and flow rate, a comparison of the A state rotational level distributions shows significant differences in the two plasmas. The rotational level distributions are generally nonlinear but can be quantitatively described as the sum of two separate Boltzmann distributions.

Publisher

SAGE Publications

Subject

Spectroscopy,Instrumentation

Link

http://journals.sagepub.com/doi/pdf/10.1366/0003702874448760

Reference16 articles.

1. Emission spectrometry

2. Influence of pressure on the properties of a microwave-induced plasma

3. Hydrogen Isotope Analysis Using a Reduced-Pressure ICP Torch

4. Characterization of Bromine and Chlorine Atomic Emission in a Reduced-Pressure Inductively Coupled (27 MHz) Helium Plasma

5. The ultraviolet bands of OH Fundamental data

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