Modeling of the effect of radicals on plasmas used for etching in microelectronics
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Published:2016
Issue:1
Volume:44
Page:105-108
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ISSN:1451-2092
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Container-title:FME Transaction
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language:en
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Short-container-title:FME Transaction
Author:
Nikitovic Zeljka,Jovanovic Jasmina,Cvelbar Uros,Mozetic Miran,Stojanovic Vladimir
Funder
Ministry of Education, Science and Technological Development of the Republic of Serbia
Publisher
Centre for Evaluation in Education and Science (CEON/CEES)
Subject
Mechanical Engineering,Mechanics of Materials