Sensitive determination of sodium in metal films on silicon wafers by graphite-furnace AAS.-Reference-Cited by-同舟云学术

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Sensitive determination of sodium in metal films on silicon wafers by graphite-furnace AAS.

Published:2000 Issue:8 Volume:49 Page:605-609
ISSN:0525-1931
Container-title:BUNSEKI KAGAKU
language:en
Short-container-title:Bunseki kagaku

Author:

KUSHIBE Sonomi¹,YABUMOTO Norikuni¹

Affiliation:

1. Materials Development and Analytical Technology Center,NTT Advanced Technology Corporation,3-1,Morinosato-Wakamiya,Atsugi-shi,Kanagawa 243-0198

Publisher

Japan Society for Analytical Chemistry

Subject

Analytical Chemistry

Link

http://www.jstage.jst.go.jp/article/bunsekikagaku/49/8/49_8_605/_pdf

Reference13 articles.

1. 1) “1998 National Technology Roadmap for Semiconductors”, (The Semiconductor Industory Association, 181 Metro Drive, Suite 450, San Jose CA 95110から入手可能).

2. Sodium Contamination in SiO2Films Induced by Plasma Ashing

3. 3) 徳山巍, 橋本哲一: “VLSI製造技術”, p.73, 165 (1989), (日経BP社).

4. 4) A. Shimazaki, H. Hiratsuka, Y. Matsushita, S. Yoshii: Extended Abstracts of the 16th Conference on Solid State Devices and Materials, p.281 (1984), Kobe.

5. Ultratrace analysis of semiconductor films by vapor phase decomposition/graphite furnace AAS.

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