Thermal stability of magnetic tunnel junctions investigated by x-ray photoelectron spectroscopy
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Published:2005
Issue:11
Volume:54
Page:5372
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ISSN:1000-3290
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Container-title:Acta Physica Sinica
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language:
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Short-container-title:Acta Phys. Sin.
Author:
Feng Yu-Qing ,Zhao Kun ,Zhu Tao ,Zhan Wen-Shan ,
Abstract
We have studied the thermal stability of magnetic tunnel junctions with and without nano-oxide layer (NOL) using x-ray hpotoelectron spectroscopy (XPS). The con centration and chemical states of elements,in particular Mn,have been obtained b y angel-resolved XPS and peak decomposition technique.It is confirmed that Mn in the antiferromagnetic layer can diffuse into the pinned ferromagnetic layer and the insulating barrier layer when a magnetic tunnel junction without NOL is ann ealed at high temperature.However,the interdiffusion of Mn during the annealing process is suppressed by inserting a NOL between the antiferromagnetic and pinne d ferromagnetic layer,and then the thermal stability is improved.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy