离子注入合成β-FeSi2薄膜的显微结构

Author:

Li Xiao-Na ,Nie Dong ,Dong Chuang ,Ma Teng-Cai ,Jin Xing ,Zhang Zhe ,

Abstract

Iron silicidefilmshavebeensynthesizedbymetalvaporvacuumarc (MEVVA)ionimplantationofironinto (1 1 1 )and (1 0 0 )orientedsiliconwafers.Thestructureevolutionwascharacterizedusingtransmissionelectronmicroscopy (TEM)andhighresolutionelectronmicroscopy (HREM) .TheβFeSi2filmsandburiedlayerswithdifferentdepthandthicknesswereobtainedbyadjustingtheimplantationenergyanddose .Theformationofα,β,γandCsCl FeSi2 phaseshavebeenobserved .ThephasetransitionorderisγFeSi2→βFeSi2→αFeSi2,CsClFeSi2→βFeSi2→αFeSi2 or βFeSi2→αFeSi2.Anamorphouslayerwasformedat60kVand 4× 1 0 1 7ions cm2 ,thephasetransitionorderisamorphous→β FeSi2 →α FeSi2 .Themorphologyandpositionofthesilicidefilmschangewiththeannealingtemperature.Thesilicidegrainsgrowwithincreasingannealingtemperaturewithfurtherincreaseoftemperature ,thecontinuoussilicidelayersshrinkintoisolatedislandsandtheinterfaceβ FeSi2 Sibe comesrougher.Inthispaper,thecomplicatedorientationrelationshipsexistingbetweenβ FeSi2 andSiwerealsoinvestigated

Publisher

Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences

Subject

General Physics and Astronomy

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