Measurement of Mg content in Zn1－xMgxO films by inductively coupled plasma method
-
Published:2006
Issue:6
Volume:55
Page:3013
-
ISSN:1000-3290
-
Container-title:Acta Physica Sinica
-
language:
-
Short-container-title:Acta Phys. Sin.
Author:
Yan Feng-Ping ,Jian Shui-Sheng ,Ogata K. ,Koike K. ,Sasa S. ,Inoue M. ,Yano M. ,
Abstract
Mg contents of Zn1-xMgxO film grown on A-sapphire substrates by molecular beam epitaxy were measured by inductively coupled plasma (ICP) method. Through theoretical analysis, an expression for the difference of Mg content in Zn1-xMgxO film calculated by simple and quadratic inspection formula was given. By comparing the measured results of the ICP with electron probe microanalysis (EPMA), the consistency of ICP with simple inspection formula and EPMA was deduced when Mg content in the samples is less than 0.5, thus the correctness of the data measured by ICP was validated.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献