Investigation of a new type nano carbon film prepared by high energy plasma assisted CVD

Abstract

Using self-fabricated equipment, new type carbon films with unfamiliar properties, high hardness and good electric conductivity were deposited on 1Cr18Ni9Ti substrate under deposition parameters of ion energy 2keV, pressure 2Pa, and methane ratio in hydrogen 10%. Process review shows that the substrate material is the key factor for the carbon films deposition, and the parameters of ion energy, pressure and methane ratio are impotent also. The grain size is less than 100nm and the film is smooth, dense and uniform as tested by AFM. Raman spectra show that there is only one broaden peak around 1580cm－1. The sheet resistance of the film is 1.6×104Ω/cm2 as measured with the ohmmeter. The micro-hardness of the film is 21.38GPa and the bulk elasticity is 420.65GPa as tested by nano-indenter. It is concluded that there may be carbon chain structure in this film.