Design of active region for GaAsP/AlGaAs tensile strain quantum well laser diodes near 800 nm wavelength
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Published:2018
Issue:6
Volume:67
Page:067801
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ISSN:1000-3290
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Container-title:Acta Physica Sinica
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language:
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Short-container-title:Acta Phys. Sin.
Abstract
As an active region, the tensile strain GaAs1-xPx quantum well plays an important role in the high power semiconductor laser diode with a wavelength of about 800 nm. Accompanied with the improved stability due to the Al-free active region, the GaAs1-xPx quantum well laser also shows a high level of catastrophic optical mirror damage because of the non-absorbing window at the facet, which is formed automatically by the relaxation of the tensile strain GaAs1-xPx material. On the other side, the GaAs1-xPx quantum well laser can provide a transverse magnetic (TM) polarized light source which is important for many solid state laser systems. However, the energy band structure of the tensile strain GaAs1-xPx quantum well is more complicated than that of the compressed or lattice matched quantum well. Although the light hole band is on the top of the heavy hole band for the bulk tensile strain GaAs1-xPx material, the situation may be different from the tensile strain GaAs1-xPx quantum well, in which the first light hole subband lh1 can be either on the top of the first heavy hole subband hh1 or reversed, that will cause the laser to generate either TM or transverse electric (TE) polarized light according to the well structure. So it is meaningful to optimize the tensile strain GaAs1-xPx quantum well structure based on the analysis of the energy band structure. Firstly, according to the 6×6 Luttinger-Kohn theory, the energy band structure of the tensile strain GaAs1-xPx quantum well is calculated by the finite difference method. The relationship between the interband transition energy and the well structure parameters is established. It is found that the well composition x and the well width should increase simultaneously, in order to fix the first subband transition wavelength at about 800 nm. Special attention is paid to the 808 nm quantum well, the valence structures of different well widths are calculated, the detailed analysis of the envelope function shows that the top valence subband is lh1 for wider well width, while it is changed to hh1 for narrower well width. Meanwhile, both the TE and the TM momentum matrix element are calculated as a function of the transverse wave vector for the subband transition from c1 to lh1, lh2, hh1 and hh2, respectively. Further, the threshold optical gains of different well widths are simulated for 808 nm laser diode with the tensile strain GaAs1-xPx quantum well as an active region, the wider well width benefits the TM mode, while the narrower one is favor of TE mode. Finally, according to the threshold carrier density, the relationship between the threshold current density and the well width is analyzed for 808 nm laser diode by considering both the spontaneous and the Auger recombination, an optimum combination of the well width and the well composition exists. For wider well width, the threshold current density will be higher because of the high energy subband carrier filling effect. For narrower well width, the decrease of the optical confinement factor will lead to the increase of threshold current density.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
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