Characteristics of the photovoltaic device with nanohole array antireflection coating layer

Abstract

The optical characteristic of the nanohole array film is analyzed by using rigorous coupled wave, and the nanohole array film is proposed to serve as photovoltaic device anti-reflection film to improve the device absorption and efficiency. According to theoretical analysis, nanohole array anti-reflection film has a better anti-reflection effect than the monofilm and can better enhance the photovoltaic device's efficiency, especially in a speetral range of 400 nm600 nm; the optimal period of the nanohole array is 500 nm, the optimal filling factor of the nanohole array is 0.2 and the optimal thickness of the nanohole array is 110 nm. In order to testify the optical effect of nanohole array, the nanohole arrays of different sizes are made by the micro-nano processing technology in the anti-reflection film of the 200 m Si Detector, and a relevant experimental system is set up. With the optimized nanohole arrays, the short circuit currents of the experimental sample are increased ～6% in a 4001100 nm spectral range, especially, increased ～15% in a 400 nm-600 nm spectral range.