Author:
Cao Peng-Fei ,Cheng Lin ,Zhang Xiao-Ping ,
Abstract
Basing on vector electromagnetic theory and the waveguide model, the vectorial Hopkins formula is deduced. It containes incidence angle and azimuth angle of off-axis illumination, which is different from the traditional scalar Hopkins formula. By simulating the aerial image of the three dimensional mask in actual lithography process, the optimal angular range of oblique incidence is analyzed, and the impact of oblique incidence angle on imaging quality is also discussed.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献