Study of the structural and optical properties of microcrystalline silicon film

Abstract

Using high-deposition-pressure technique, high-quality microcrystalline silicon film was prepared by radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD) combined with rapid thermal treatment. The volume fractions of the amorphous and microcrystalline phases and optical properties of microcrystalline silicon were carefully studied by Raman spectra, reflectance spectra and transmittance spectra. The results show a red shift of the absorption edge of microcrystalline silicon, which can be due to the increase in the volume fractions of the amorphous and microcrystalline phase and decrease in the band tail states.