Author:
Zhang Ze-Hai ,Shu Ting ,Zhang Jun ,Qi Zu-Min ,
Abstract
With numerical calculation and particle simulation program, the influences of the intense electron beam impedance, voltage and current characteristics on the beam modulation and bunching characteristics in relativistic klystron amplifier (RKA) are analyzed. Within the particle-in-cell simulation program, the beam emission method is used to accurately control the impedance of the electron beam. The results show that the electron beam of low-impedance can reduce the bunching distance and shorten the overall length of the RKA devices but degrade the injected modulation of the electron beam. Electron beam of high impedance is just opposite. When the electron beam impedance is constant, the increase of the electron beam accelerating voltage is similar to the increase of the impedance of the electron beam. In addition, with the particle simulation method, the beam loaded conductance of a specific input cavity loaded by a different impedance of the electron beam is determined, thereby meeting the demand of the power level of the seed, and the requirements for the externally loaded quality factor of the input cavity.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
Reference18 articles.
1. Ding Y G 2010 Design, Manufacture and Application of High Power Klystron (Beijing: National Defense Industry Press) pp8-17 (in Chinese) [丁耀根 2010 大功率速调管的设计制造和应用(北京: 国防工业出版社) 第8–17页]
2. Huang H, Fan Z K, Tan J, Ma Q S, Gan Y Q, Chang A B 2004 Acta Phys. Sin. 53 1129 (in Chinese) [黄华, 范植开, 谭杰, 马乔生, 甘延青, 常安碧 2004 物理学报 53 1129]
3. Huang H, Meng F B, Fan Z K, Li Z H 2006 Acta Phys. Sin. 55 5344 (in Chinese) [黄华, 孟凡宝, 范植开, 李正红2006 物理学报 55 5344]
4. Bai X C, Yang J H, Zhang J D 2012 Phys. Plasma 19 083106
5. Liu J, Shu T, Li Z Q 2010 Acta Phys. Sin. 59 2622 ( in Chinese) [刘静, 舒挺, 李志强 2010 物理学报 59 2622]
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献