Micro-distribution of carbon in semi-insulating gallium arsenide
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Published:2005
Issue:4
Volume:54
Page:1904
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ISSN:1000-3290
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Container-title:Acta Physica Sinica
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language:
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Short-container-title:Acta Phys. Sin.
Author:
Xu Yue-Sheng ,Yang Xin-Rong ,Wang Hai-Yun ,Tang Lei ,Liu Cai-Chi ,Wei Xin ,Qin Dao-Zhi ,
Abstract
Micro-distribution of C acceptor defect in semi-insulating gallium arsenide (SI-GaAs) wafer has been investigated by means of chemical etching, microscopic observation, transmission electron microscope, eelectron probe x-ray microanalyz er.Experimental results show that there is a corresponding relationship between the distribution of C impurity and dislocation density in a wafer. In relatively high dislocation density areas, dislocations form relatively small cells with few isolated dislocation within each cell. Here the profile of C distribution in the area of a cell is “U”-shaped. The cell diameter increases as the dislocation density decreases, and the dislocations form relatively large cells with a few isolated dislocations within each cell. The profiles of C distributio n in the area of a cell is “W”-shaped.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
Cited by
1 articles.
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