Graphene modification based on plasma technologies

Author:

Zhao Wen-Qi,Zhang Dai,Cui Ming-Hui,Du Ying,Zhang Shu-Yu,Ou Qiong-Rong,

Abstract

Plasma contains highly reactive species, including electrons, ions, radicals, photons, etc., which are critical for catalyzing or directly participating in chemical reactions. Plasma is a highly efficient tool in chemical synthesis and material modification, since it can make the chemical reactions that are difficult or even impossible to occur under thermal equilibrium conditions take place and accelerate through its catalysis. The chemical reactivity of graphene under conventional conditions is low, which means that the reaction of graphene requires high temperature, high pressure and/or strong acid or alkali, thereby restricting the synthesis and modification of novel graphene-derived materials. Plasma-assisted graphene reaction can trigger a series of chemical reactions, such as reduction, oxidation, defect repair, doping, grafting, epitaxial growth and cross-linking of graphene, under ambient temperature and pressure without any corrosive conditions. It provides great potentials for the functional modification of graphene and the synthesis of graphene composites, which deserve further exploration. Over the past decade, a number of studies of graphene synthesis and modification by using plasma with distinctive characteristics have been reported. However, most of reports focused on the presentation of technical routes and corresponding results, and the research on chemical reaction kinetics is still far from being fully addressed. In this review, we make a comprehensive discussion about these reports by mainly summarizing and discussing some of the representative results, in order to promote further research in the relevant fields.

Publisher

Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences

Subject

General Physics and Astronomy

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3