EFFECTS OF DEPOSITION TEMPERATURE ON ELECTRICAL PROPERTIES OF HYDROGENATED AMORP HOUS CARBON FILMS
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Published:2000
Issue:10
Volume:49
Page:2041
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ISSN:1000-3290
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Container-title:Acta Physica Sinica
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language:
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Short-container-title:Acta Phys. Sin.
Author:
CHENG SHAN-HUA ,NING ZHAO-YUAN ,KAN JIAN ,MA CHUN-LAN ,YE CHAO ,
Abstract
Hydrogenated amorphous carbon films were deposited using ECR plasma with benzene as carbon source at varying substrate temperature. The effects of deposition te mperature on the resistivity and the intensity of electric break down have been investigated. The results show these properties depend on their growth condition s. The experiment results are further investigated using Raman spectra analysis.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
Cited by
1 articles.
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