STUDY ON A METHOD OF THE THICKNESS MEASUREMENT OF ULTRA-THIN PtSi FILM
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Published:2001
Issue:8
Volume:50
Page:1447
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ISSN:1000-3290
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Container-title:Acta Physica Sinica
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language:
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Short-container-title:Acta Phys. Sin.
Author:
LIU SHUANG ,NING YONG-GONG ,ZHANG YI ,ZHANG HUAI-WU ,CHEN AI ,LIU JUN-GANG ,YANG JIA-DE ,LI KUN ,
Abstract
Based on X-ray photoelectron spectrum intensity measurements of thin film by ARXPS, a method of determination of the thickness of PtSi ultra-thin films through calculations of electrom mean free path, is described in this article.The result of calculation is in agreement with that of the TEM crystal lattice images analysis.It shows that the method is convenient and can be used to determine the thickness of other ultra-thin films.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy