Uniformity optimization of ion beam sputtering coating equipment based on strong current ion source

Abstract

The widespread application of ion beam sputtering coating, particularly in optical devices, necessitates enhanced beam current strength and uniformity for large area uniform coatings. The advent of high current Penning sources offers a potential solution. This study introduces an automated optimization simulation method based on a three-electrode extraction system to investigate its impact on ion beam quality and uniformity. Focusing on high current intensity and uniformity, our simulation explores the effects of plasma electrode, inhibition electrode, and extraction electrode angles and distances on ion beam performance. Evaluation metrics include average beam intensity density, average energy of a single particle, and reciprocal variance of each macro particle position, achieved through normalization functions, allowing for a comprehensive comparison of simulation results. To assess coating efficiency, we estimate sputtering yield and depth. The study identifies patterns among electrodes and emphasizes the influence of different ion ratios on beam extraction. Results indicate that optimizing the angle of the plasma electrode and the distance of the suppressed electrode yields a highly uniform ion beam for low charge ions. However, for highly charged ions, similar optimization compromises current strength, necessitating compensation through electrode shape optimization. This research provides a model for systematically optimizing the three-electrode extraction system, guiding researchers in achieving optimal solutions based on ion source characteristics and application requirements. Additionally, we introduce a method for estimating the sputtering depth of mixed ion beams. This concise article contributes valuable insights to advance ion beam sputtering coating technology and informs decision-making in ion source design and application.