Author:
CHEN MIN ,WEI HE-LIN ,LIU ZU-LI ,YAO KAI-LUN ,
Abstract
The effect of low-energy deposition particles on the initial stage of thin film growth is studied by Monte Carlo simulation in this paper. The energy range of deposition particles is from 0 to 0.7eV. Three processes are considered: atom deposition, adatom diffusion and re evaporation. The effect of nearest adatoms and next near adatoms is also considered. The results show that the low-energy ion irradiation strongly affects the island film growth process at low temperature. Morphologies and size distributions of islands have significantly changed with the increase of incident ion energy.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献