Author:
Kuang Deng-Feng ,Liu Qing-Gang ,Hu Xiao-Tang ,Hu Liu-Chang ,Guo Wei-Lian ,
Abstract
Applicable nano metric titanium-titanium oxide line-titanium tunneling junction was fabricated with dual-facing target sputtering,micro-electronic optical lithography and atomic force microscope anodic oxidation.The thickness of titanium film of the fabricated junction was 3nm and the width of the titanium oxide line was 60.5nm.The I-V curve of the tunneling junction at room temperature clearly indicates the Coulomb blockade effect.
Publisher
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
Subject
General Physics and Astronomy
Cited by
6 articles.
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