Optimization of Plasma Enhanced Chemical Vapor Deposition Process Parameters for Hardness improvement of Diamond Like Carbon Coatings-Reference-Cited by-同舟云学术

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Optimization of Plasma Enhanced Chemical Vapor Deposition Process Parameters for Hardness improvement of Diamond Like Carbon Coatings

Published:2022-04-26 Issue:0 Volume:0 Page:0-0
ISSN:2345-3605
Container-title:Scientia Iranica
language:en
Short-container-title:Scientia Iranica

Author:

Kalita Kanak,Ghadai Ranjan Kumar

Publisher

SCI AND TECH UNIVERSAL INC

Subject

General Engineering

Link

http://scientiairanica.sharif.edu/article_22750_b0ea82fffaa306c67265add23467e8d8.pdf

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of deposition temperature on the tribo-mechanical properties of nitrogen doped DLC thin film;Frontiers in Mechanical Engineering;2024-02-21

2. Recent Progress on the Tribology of Pure/Doped Diamond-like Carbon Coatings and Ionic Liquids;Coatings;2024-01-04

3. Movie Recommender Systems: Concepts, Methods, Challenges, and Future Directions;Sensors;2022-06-29

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