Pairing 1927-nm and 1440-nm Fractional Diode Lasers During Single Session Resurfacing of the Face

Author:

Wang Jordan V.1,Bajaj Shirin1,Steuer Alexa2,Geronemus Roy G.12

Affiliation:

1. Laser & Skin Surgery Center of New York, New York, New York;

2. The Ronald O Perelman Department of Dermatology, New York University Langone Health, New York, New York

Publisher

Ovid Technologies (Wolters Kluwer Health)

Reference5 articles.

1. The 1440 nm and 1927 nm nonablative fractional diode laser: current trends and future directions;Friedman;J Drugs Dermatol,2020

2. Evaluation of a low energy, low density, non-ablative fractional 1927 nm wavelength laser for facial skin resurfacing;Brauer;J Drugs Dermatol,2015

3. 1,550 nm erbium-doped and 1,927 nm thulium nonablative fractional laser system: best practices and treatment setting recommendations;Friedman;Dermatol Surg,2022

4. Enhancing skin uptake of topical antioxidants with 1,440-nm nonablative fractional diode laser pretreatment;Wang;Dermatol Surg,2022

5. Combining low-power fractional diode laser with injectable neurotoxin and filler: safety of treatment regimen over 6 years;Wang;Dermatol Surg,2021

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