Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces-Reference-Cited by-同舟云学术

Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces

Published:2019-01-04 Issue:1 Volume:5 Page:
ISSN:2375-2548
Container-title:Science Advances
language:en
Short-container-title:Sci. Adv.

Author:

Dwivedi Neeraj¹,Yeo Reuben J.¹²,Dhand Chetna³,Risan Jared⁴,Nay Richard⁴^ORCID,Tripathy Sudhiranjan⁵,Rajauria Sukumar⁶^ORCID,Saifullah Mohammad S. M.⁵^ORCID,Sankaranarayanan Subramanian K. R. S.⁷^ORCID,Yang Hyunsoo¹,Danner Aaron¹,Bhatia Charanjit S.¹

Affiliation:

1. Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Republic of Singapore.

2. Institute of Materials, Ecole Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland.

3. Singapore Eye Research Institute, Singapore 169856, Republic of Singapore.

4. Hysitron Inc., 10025 Valley Road, Minneapolis, MN 55344, USA.

5. Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology, and Research), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Republic of Singapore.

6. Western Digital Company, Recording Sub System Staging and Research, San Jose, CA 95135, USA.

7. Center for Nanoscale Materials, Argonne National Laboratory, 9700 S Cass Avenue, Argonne, IL 60439, USA.

Abstract

Multiple mixed interfaces and a critical carbon thickness in sub-10-nm overcoats are essential for low wear and friction .

Funder

National Research Foundation, Prime Minister’s Office, Singapore

A*STAR Nanoimprint Foundry, Singapore

U.S. Department of Energy, Office of Science

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary