Silicon flexoelectronic transistors

Author:

Guo Di12ORCID,Guo Pengwen13ORCID,Ren Lele13ORCID,Yao Yuan12,Wang Wei13ORCID,Jia Mengmeng13ORCID,Wang Yulong12ORCID,Wang Longfei13ORCID,Wang Zhong Lin14ORCID,Zhai Junyi123ORCID

Affiliation:

1. CAS Center for Excellence in Nanoscience, Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, P. R. China.

2. School of Chemistry and Chemical Engineering, Center on Nanoenergy Research, School of Physical Science and Technology, Guangxi University, Nanning 530004, P. R. China.

3. School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, P. R. China.

4. Georgia Institute of Technology, Atlanta, GA 30332, USA.

Abstract

It is extraordinarily challenging to implement adaptive and seamless interactions between mechanical triggering and current silicon technology for tunable electronics, human-machine interfaces, and micro/nanoelectromechanical systems. Here, we report Si flexoelectronic transistors (SFTs) that can innovatively convert applied mechanical actuations into electrical control signals and achieve directly electromechanical function. Using the strain gradient–induced flexoelectric polarization field in Si as a “gate,” the metal-semiconductor interfacial Schottky barriers’ heights and the channel width of SFT can be substantially modulated, resulting in tunable electronic transports with specific characteristics. Such SFTs and corresponding perception system can not only create a high strain sensitivity but also identify where the mechanical force is applied. These findings provide an in-depth understanding about the mechanism of interface gating and channel width gating in flexoelectronics and develop highly sensitive silicon-based strain sensors, which has great potential to construct the next-generation silicon electromechanical nanodevices and nanosystems.

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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