Near-IR squaraine dye–loaded gated periodic mesoporous organosilica for photo-oxidation of phenol in a continuous-flow device-Reference-Cited by-同舟云学术

Near-IR squaraine dye–loaded gated periodic mesoporous organosilica for photo-oxidation of phenol in a continuous-flow device

Published:2015-09-04 Issue:8 Volume:1 Page:
ISSN:2375-2548
Container-title:Science Advances
language:en
Short-container-title:Sci. Adv.

Author:

Borah Parijat¹^ORCID,Sreejith Sivaramapanicker¹^ORCID,Anees Palapuravan²,Menon Nishanth Venugopal³^ORCID,Kang Yuejun³^ORCID,Ajayaghosh Ayyappanpillai²,Zhao Yanli¹⁴^ORCID

Affiliation:

1. Division of Chemistry and Biological Chemistry, School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, 637371 Singapore, Singapore.

2. Photosciences and Photonics Group, Chemical Sciences and Technology Division, Council of Scientific and Industrial Research–National Institute for Interdisciplinary Science and Technology, Trivandrum 695019, India.

3. School of Chemical and Biomedical Engineering, Nanyang Technological University, 62 Nanyang Drive, 637459 Singapore, Singapore.

4. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, 639798 Singapore, Singapore.

Abstract

A study of dye-loaded organosilica for photo-oxidation.

Funder

NRF Fellowship

CREATE Programme

NTU-A*Star Centre of Excellence for Silicon Technologies

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary